AS Coating Process
Advantages of the AS Coating Process
The ceramic coating of the AS implants is applied by a vacuum deposition process (PVD = Physical Vapor Deposition). The elements of the coating are vaporized in the coating process. The molecules condensed from the vapor (plasma) settle on the substrate material.
The main advantage of this process is the low coating temperature (200 - 500°C) which preserves the sensitive substrate materials.
By appropriate selection of the coating targets and reaction gases, a large variety of layers can be produced.
This allows the creation of variable layer structures optimally adapted to intended function of the product, especially with regard to adhesion, toughness and hardness gradients.